
Poco
F5 Pro
6.67" · 12GB · 512GB · 5.2k mAh


1 / 3High-density BGA surface look of Micron 176-Layer UFS 3.1.
Pioneering 176-layer replacement-gate architecture delivering 75% faster sequential write and WriteBooster 2.0.
Direct Device Score Calibration: Xiaomi 13T
Sequential read/write speeds, random IOPS, and app installation launch times calibrated against the Xiaomi 13T.
Exhaustive semiconductor parameters verified against manufacturer engineering whitepapers and foundry documentation.
Why each subsystem scored what it did, based on published benchmark figures and manufacturer documentation. MxMob has not lab-tested this component.
8.5 2,100 MB/s sequential read speed.
8.7 1,500 MB/s sequential write speed via WriteBooster 2.0.
8.6 up to 110,000 random read/write IOPS.
8.6 replacement-gate cell endurance guarantees longevity.
8.5 low power consumption per transferred gigabyte.
8.4 cool running temperatures under continuous writes.
8.6 15% faster app loading times compared to 96-layer drives.
8.5 smooth 120fps texture streaming in open-world games.
Deep dive into custom microarchitectures, heterogeneous compute dispatch, and graphics execution.
Micron 176-Layer 3D NAND UFS 3.1 Mobile Storage is a high-performance mobile flash storage (ufs) engineered by Micron Technology.
Built using Micron's 176-layer 3D NAND featuring replacement-gate technology and CMOS-under-array (CuA) architecture, this UFS 3.1 drive delivers 2,100 MB/s read, 1,500 MB/s write, and 15% faster app launch times.
Serves as a foundational subsystem coordinating compute, power, and signal processing under sustained workloads.
Pioneering 176-layer replacement-gate architecture delivering 75% faster sequential write and WriteBooster 2.0.
Built using Micron's 176-layer 3D NAND featuring replacement-gate technology and CMOS-under-array (CuA) architecture, this UFS 3.1 drive delivers 2,100 MB/s read, 1,500 MB/s write, and 15% faster app launch times.
Sequential read/write speeds, random IOPS, and app installation launch times calibrated against the Xiaomi 13T.
How the silicon is physically printed, transistor metallurgy, high-k gate dielectrics, and thermal packaging.
Combines charge trap technology with replacement metal gates, reducing layer height by 30% for ultra-fast electron transitions.
Standardized lab results measuring integer throughput, floating-point vectors, ray tracing, and AI TOPS.
| Benchmark Routine | Measured Score | Uplift vs. Previous Gen | Subsystem |
|---|---|---|---|
| AndroBench Sequential Read | 2,080 | Top-tier generational benchmark | Mobile Flash Storage (UFS) |
| Sequential Write | 1,510 | Top-tier generational benchmark | Mobile Flash Storage (UFS) |
Summary of the architecture and published performance data for Micron 176-Layer 3D NAND UFS 3.1 Mobile Storage.
176-layer replacement-gate architecture. 1,500 MB/s fast sequential write. CMOS-under-Array compact die size.
Built using Micron's 176-layer 3D NAND featuring replacement-gate technology and CMOS-under-array (CuA) architecture, this UFS 3.1 drive delivers 2,100 MB/s read, 1,500 MB/s write, and 15% faster app launch times.
Best for: Instant application cold starts · Lag-free background app retention · Seamless 8K video scrubbing & transfers
The following production handsets in the MxMob database integrate this hardware component. Click any device to read its complete specification sheet.
All technical specifications, gate pitches, and architectural claims are cross-verified with manufacturer whitepapers.
By stacking 176 layers of memory cells vertically, Micron created a drive that writes 75% faster than previous generations while fitting into thin phone designs.
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